The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 11, 2001
Filed:
Dec. 11, 1998
Gregory A. Johnson, Colorado Springs, CO (US);
Kunal N. Taravade, Colorado Springs, CO (US);
LSI Logic Corporation, Milpitas, CA (US);
Abstract
A method of exposing an alignment mark defined in a first side of a semiconductor wafer includes the step of engaging a second side of the wafer with a wafer chuck. The method also includes the step of positioning the wafer in a chamber having a photochemical reactant gas present therein during the engaging step. Moreover, the method includes the step of impinging laser beams on the first side of the wafer such that a reactant specie is generated from the photochemical reactant gas. Yet further, the method includes the step of removing material from the first side of the wafer with the reactant specie. An apparatus for exposing an alignment mark defined in a first side of a semiconductor wafer is also disclosed.