The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 11, 2001

Filed:

Apr. 02, 1999
Applicant:
Inventors:

Norihiko Kamiura, Yokohama, JP;

Yoshiki Ishizuka, Yokohama, JP;

Assignee:

Kabushiki Kaisha Toshiba, Kawasaki, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/976 ; H01L 3/1036 ; H01L 3/1112 ; H01L 2/7108 ; H01L 2/904 ;
U.S. Cl.
CPC ...
H01L 2/976 ; H01L 3/1036 ; H01L 3/1112 ; H01L 2/7108 ; H01L 2/904 ;
Abstract

A thin film transistor includes: an insulating substrate; a semiconductor layer of a polycrystalline silicon formed on the insulating substrate; a gate insulator film formed so as to contact the semiconductor layer; a gate electrode formed so as to contact the gate insulator film; an active layer formed in a region of the semiconductor layer corresponding to the gate electrode; a first semiconductor region which is formed in the semiconductor layer outside of the active layer and which has an impurity concentration of higher than or equal to 1×10,cm,and lower than 1×10,cm,; and a second semiconductor region which is formed in the semiconductor layer outside of the first semiconductor region and which has an impurity concentration of higher than that of the first semiconductor region, the second semiconductor region having the same conductive type as that of the first semiconductor region. Thus, it is possible to obtain a reliable thin film transistor having small OFF current.


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