The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 11, 2001
Filed:
Nov. 02, 1999
Kevin R. Stewart, Schenectady, NY (US);
Janet L. Gordon, Clifton Park, NY (US);
Kwok Pong Chan, Troy, NY (US);
David G. Gascoyne, Schenectady, NY (US);
Feng Pan, Clifton Park, NY (US);
Molecular OptoElectronics Corporation, Watervliet, NY (US);
Abstract
Chiral organic polymers doped with or appended by nonlinear optical dyes are disclosed. The use of chiral polymers produces a more stable noncentrosymmetric environment for the dye molecules resulting in unexpectedly long relaxation times as compared with previously used organic polymers. In addition, the NLO/chiral polymer materials exhibit high electro-optical coefficients (r,), high nonlinear optical coefficients (d,), improved long-term thermal stability, and at the same time retain the processing advantages associated with organic polymers. Thus, the present NLO/chiral polymer materials are extremely well-suited for use in second-order nonlinear optical and optoelectronics devices.