The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 11, 2001

Filed:

Jun. 03, 1999
Applicant:
Inventors:

Karl F. Schimmel, Verona, PA (US);

Karen A. Barkac, Murrysville, PA (US);

Kurt A. Humbert, Allison Park, PA (US);

Jonathan D. Goetz, Sarver, PA (US);

James B. O'Dwyer, Valencia, PA (US);

Assignee:

PPG Industries Ohio, Inc., Cleveland, OH (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F / ; C08F / ; C08F / ;
U.S. Cl.
CPC ...
C08F / ; C08F / ; C08F / ;
Abstract

Block copolymers containing at least two blocks are provided and comprise: (a) a first block containing residues of at least one first ethylenically unsaturated radically polymerizable monomer that is free of hydroxy functionality, e.g., 2-ethylhexyl methacrylate, and a minor amount of at least one hydroxy functional ethylenically unsaturated radically polymerizable monomer, e.g., hydroxypropyl methacrylate; and (b) a second block containing residues of at least one second ethylenically unsaturated radically polymerizable monomer that is free of hydroxy functionality, e.g., iso-butyl methacrylate, and a minor amount of at least one hydroxy functional ethylenically unsaturated radically polymerizable monomer. The calculated Tg of the second monomer of the block copolymer is at least 20° C. greater than the calculated Tg of the first monomer.


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