The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 11, 2001
Filed:
Mar. 03, 1999
Applicant:
Inventors:
Kailish C. Srivastava, Centreville, VA (US);
Seema Garg, Centreville, VA (US);
Daman S. Walia, Clifton, VA (US);
Assignee:
Arctech Inc., Chantilly, VA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61L 9/01 ; C12N 1/00 ;
U.S. Cl.
CPC ...
A61L 9/01 ; C12N 1/00 ;
Abstract
A microbial consortium, ATCC 202177, is enriched to remove target sulfur compounds from gases in the presence of ammonia, cyanide, carbon monoxide, and other toxic gases and mixtures thereof. The ATCC 202177 consortium is cultured in an anaerobic or aerobic nutrient medium until enough cells of ATCC 202177 are recovered to remove the target sulfur species at a pressure ranging from 1 to 80 atmospheres.