The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 11, 2001
Filed:
Aug. 21, 1998
Danny T. Xiao, Willington, CT (US);
Chris W. Strock, Storrs, CT (US);
Donald M. Wang, Storrs, CT (US);
Peter R. Strutt, Storrs, CT (US);
Inframat Corporation, North Haven, CT (US);
Abstract
A method comprising incorporation of an inorganic polymer precursor of a grain growth inhibitor into nanostructured materials or intermediates useful for the production of nanostructured materials. The precursor/nanostructured material composite is optionally heat treated at a temperature below the grain growth temperature of the nanostructured material in order to more effectively disperse the precursor. The composites are then heat treated at a temperature effective to decompose the precursor and to form nanostructured materials having grain growth inhibitors uniformly distributed at the grain boundaries. Synthesis of the inorganic polymer solution comprises forming an inorganic polymer from a solution of metal salts, filtering the polymer, and drying. Alloying additives as well as grain growth inhibitors may be incorporated into the nanostructured materials.