The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 11, 2001

Filed:

Jul. 23, 1999
Applicant:
Inventors:

Bin Huang, Fremont, CA (US);

Edward Hinpong Lee, San Jose, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G11B 5/127 ; G03C 5/56 ;
U.S. Cl.
CPC ...
G11B 5/127 ; G03C 5/56 ;
Abstract

A method of making a second pole piece layer that has a yoke portion between a pole tip portion and a back gap portion comprising the steps of forming a first photoresist layer that is sensitive to a first bandwidth of light, forming a second photoresist layer on the first photoresist layer that is sensitive to a second bandwidth of light that is different from the first bandwidth of light, after forming the first and second photoresist layers, photopatterning the second photoresist layer with the second bandwidth of light to provide an opening at pole tip, yoke and back gap sites wherein the pole tip, yoke and back gap sites define perimeters for the pole tip, yoke and back gap portions respectively, after photopatterning the second photoresist layer, photopatterning the first photoresist layer with the first bandwidth of light to provide openings at the pole tip, yoke and back gap sites and then plating the pole tip, yoke and back gap portions of the second pole piece layer in the openings of the first and second photoresist layers.


Find Patent Forward Citations

Loading…