The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 04, 2001

Filed:

Sep. 25, 2000
Applicant:
Inventors:

Roger W. Budnik, Rochester, NY (US);

James M. Pacer, Webster, NY (US);

Scott L. Kauffman, Rochester, NY (US);

Richard M. Maier, Rochester, NY (US);

Michael G. Swales, Sodus, NY (US);

Assignee:

Xerox Corporation, Stamford, CT (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03L 1/508 ;
U.S. Cl.
CPC ...
G03L 1/508 ;
Abstract

In a xerographic development system in which an AC field is set up in a gap between a donor member and the photoreceptor to develop an electrostatic latent image, a series of tests are performed to ascertain that the width of the gap is within a suitable range. In test mode, various DC and AC biases associated with the field are systematically altered, and the reflectivities of resulting test images are read. Based on these reflectivity readings, it can be determined if the gap is too wide, such as to cause poor print quality, or too narrow, such as to cause arcing.


Find Patent Forward Citations

Budnik, Roger. (2001). System for determining development gap width in a xerographic development system using an ac field (U.S. Patent No. 6285837). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6285837

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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