The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 04, 2001

Filed:

Apr. 20, 1999
Applicant:
Inventors:

Tie Quan Wei, Bear, DE (US);

Thomas John Pankratz, Newark, DE (US);

Victor Pichai Chu, Hockessin, DE (US);

Assignee:

Dade Behring Inc., Deerfield, IL (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 3/353 ; G01N 3/3543 ; G01N 2/100 ; A61K 4/900 ; C07K 1/600 ;
U.S. Cl.
CPC ...
G01N 3/353 ; G01N 3/3543 ; G01N 2/100 ; A61K 4/900 ; C07K 1/600 ;
Abstract

Calibrating an immunoassay by generating two reaction rate measuring curves, from samples having higher and lower relative levels of antigen, extrapolating a combination of the curves to cover sample concentrations known to contain an excess of antigen relative to an amount of capture reagent and combining the low end linear potion of the higher reaction rate measuring curve with the higher end portion of the extrapolated reaction rate measuring curve, thereby eliminating measuring inaccuracies otherwise arising from the hook effect. For antigen concentrations higher than the assay range, a high antigen signal utilizing the two rates avoids reporting false results.


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