The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 04, 2001

Filed:

Nov. 25, 1998
Applicant:
Inventors:

Hiroichi Ishikawa, Kanagawa, JP;

Barret Lippey, Kanagawa, JP;

Tomio Kobayashi, Miyagi, JP;

Yoshihiro Oshima, Gifu, JP;

Shinobu Mitsuhashi, Kanagawa, JP;

Masataka Yamashita, Gifu, JP;

Yoshiharu Honjo, Kanagawa, JP;

Koichi Kaneko, Gifu, JP;

Assignee:

Sony Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B32B 9/00 ; B32B 1/704 ;
U.S. Cl.
CPC ...
B32B 9/00 ; B32B 1/704 ;
Abstract

Disclosed is an antireflection film used to be stuck on the surface of a glass panel of a CRT, which can be inexpensively manufactured at a high productivity while satisfying all of requirements regarding its adhesive strength, reflectance characteristic, electric resistance and total light transmittance. The antireflection film is formed by stacking silicon oxide films and indium tin oxide films on a base film in multilevels, wherein the thickness of the uppermost silicon oxide film of the antireflection film is thicker than the indium tin oxide film directly under the uppermost silicon oxide film, and the lowermost silicon oxide film, positioned at the interface with the base film, of the antireflection film is a SiO,film where the value x is in a range of 0.5 to 1.9.


Find Patent Forward Citations

Loading…