The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 28, 2001

Filed:

Sep. 03, 1999
Applicant:
Inventors:

Jochen Wieser, Munich, DE;

Andreas Ulrich, Munich, DE;

Daniel E. Murnick, Bernardsville, NJ (US);

Werner Krötz, Munich, DE;

Assignee:

Rutgers, The State University, New Brunswick, NJ (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01S 3/0959 ; H01S 3/225 ;
U.S. Cl.
CPC ...
H01S 3/0959 ; H01S 3/225 ;
Abstract

Excimers are generated by directing an electron beam at about 5 KeV to about 40 KeV into an excimer forming gas such as He, Ne, Ar, Kr, and Xe or mixtures of these with other gases through a ceramic foil such as SiN,. Vacuum ultraviolet (VUV) light is emitted by the excimers or by other species in contact therewith. The invention can provide intense, continuously operable broadband or monochromatic VUV light sources.


Find Patent Forward Citations

Wieser, Jochen. (2001). Electron beam irradiation of gases and light source using the same (U.S. Patent No. 6282222). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6282222

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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