The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 28, 2001
Filed:
Jun. 16, 2000
Applicant:
Inventor:
Christopher L. Pike, Fremont, CA (US);
Assignee:
Advanced Micro Devices, Inc., Sunnyvale, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
M01L 2/1302 ; M01L 2/1469 ;
U.S. Cl.
CPC ...
M01L 2/1302 ; M01L 2/1469 ;
Abstract
There is provided a method of applying a developing liquid onto a semiconductor wafer substrate having a UTR film thereon so as to minimize unexposed film thickness loss during development. This is achieved by applying the developing liquid from a developer nozzle which is off-set from the central position of the wafer substrate. The developing liquid is allowed to contact the wafer substrate for less than 10 seconds. As a result, there is overcome the problems of unexposed film thickness loss and critical dimension variations due to the developer nozzle effects.