The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 28, 2001
Filed:
Apr. 21, 1994
Applicant:
Inventors:
Gary Carl Bjorklund, Los Altos, CA (US);
William Esco Moerner, San Jose, CA (US);
Scott Meixner Silence, Rochester, NY (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03H 1/02 ;
U.S. Cl.
CPC ...
G03H 1/02 ;
Abstract
The present invention relates to an improved process for photorefractive index grating formation utilizing polymeric photorefractive materials. The process involves the steps of: (i) exposing a polymeric optical article to electromagnetic radiation having an intensity of at least 0.05 W/cm,for a short period of time to achieve an absorbed energy/unit volume of at least 1×10,J/cm,to activate the article, and (ii) exposing the polymeric optical article to an electric field and electromagnetic radiation to form an index grating.