The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 28, 2001
Filed:
Jun. 08, 1999
Applicant:
Inventors:
Junji Nishii, Ikeda, JP;
Adilson Oliveira da Silva, Ikeda, JP;
Derek A. H. Cunningham, Ikeda, JP;
Takahiro Inoue, Ikeda, JP;
Assignee:
Agency of Industrial Science & Technology, Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C01G 2/3047 ; B32B 1/706 ; B32B 9/00 ; B32B 1/500 ; B05D 5/06 ;
U.S. Cl.
CPC ...
C01G 2/3047 ; B32B 1/706 ; B32B 9/00 ; B32B 1/500 ; B05D 5/06 ;
Abstract
A film containing TiO,and SiO,. It is formed by depositing TiO,and SiO,onto a substrate by sputtering method, or depositing their vapors thereon. The film is heat treated at a temperature of 200-1200° C. to form a film of anatase type TiO,containing SiO,.