The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 28, 2001
Filed:
Apr. 23, 1999
Applicant:
Inventors:
Edward P. Martin, Orlando, FL (US);
Morgan J. Thoma, Orlando, FL (US);
Daniel J. Vitkavage, Orlando, FL (US);
Assignee:
Agere Systems Guardian Corp., Orlando, FL (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B44C 1/22 ;
U.S. Cl.
CPC ...
B44C 1/22 ;
Abstract
The invention provides a method of planarizing an irregular surface of a semiconductor wafer. In one embodiment, the method comprises applying a photoresist material over recessed areas and protruding areas of the irregular surface, etching the photoresist, etching partially into protruding areas of the irregular surface to remove a portion of the irregular surface, and polishing the irregular surface to a substantially planar surface. In some embodiments method may include chemically and mechanically polishing the irregular surface.