The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 21, 2001
Filed:
Dec. 21, 1999
Atsuko Okawa, Yokohama, JP;
Yasuo Hira, Yokohama, JP;
Hirotaka Imayama, Kawasaki, JP;
Masayasu Fujisawa, Naka-gun, JP;
Saburou Suzuki, Minamiashigara, JP;
Eisei Togawa, Odawara, JP;
Noriyuki Saiki, Odawara, JP;
Nobuo Suzuki, Fujisawa, JP;
Hiroshi Agari, Odawara, JP;
Kiyoshi Akamatsu, Yokohama, JP;
Hiromu Chiba, Yokohama, JP;
Hiatchi, LTD, Tokyo, JP;
Abstract
For removing re-deposited particulates produced during an etching process of a magnetic head slider and forming a minute chamfered portion, a polishing process is carried out by using polishing cloth such as non-woven polyester fabric after having formed rails of non-linear shape on a floating surface by the etching process. Thus, the re-deposited particulates produced during the etching process are removed, whereby the reliability of the floating characteristic of magnetic head is improved.