The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 21, 2001
Filed:
Dec. 29, 1997
Tsuyoshi Watanabe, Kitakoma-gun, JP;
Koji Takahashi, Nakakoma-gun, JP;
Masao Takano, Kitakoma-gun, JP;
Hoya Corporation, Tokyo, JP;
Abstract
In a magnetic recording medium, surface roughness of a glass substrate and the variation of the surface roughness are suppressed. Namely, the surface roughness (Rmax, Ra, Rq) and the relation (Rmax/Ra) between Rmax and Ra are restricted. Ra is representative of a center-line mean roughness, Rmax is defined as a maximum height representative of a difference between a highest point and a lowest point and Rq is representative of a root mean square roughness. Thereby, crystal grains of an underlying layer and a magnetic layer formed thereon are equalized. The surface roughness is specified by Rmax≦15 nm, Ra≦1 nm and Rq≦1.5 nm and the ratio between the surface roughness Rmax and the surface roughness Ra is in the range of 10 to 30.