The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 14, 2001

Filed:

Jul. 30, 1998
Applicant:
Inventor:

Yasushi Yoshida, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 7/00 ;
U.S. Cl.
CPC ...
G06F 7/00 ;
Abstract

A substrate processing apparatus has a plurality of processing chamber groups including at least one processing chamber group of a plurality of processing chambers for identically processing substrates concurrently therein, and a substrate feeder for feeding substrates to each of the processing chamber groups. A value calculated by dividing times required to process substrates in the processing chambers and times required to feed substrates to the processing chambers, by the number of the processing chambers is set to a tact time, and substrates are loaded into the substrate processing apparatus at intervals of the tact time. A time equal to or greater than a time required for the substrate feeder to perform a feed job is established as a feed slot, and a plurality of feed slots are established in the tact time. Substrates are loaded into the substrate processing apparatus with the substrate feeder in timed relation to the feed slots.


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Yoshida, Yasushi. (2001). Substrate feed control (U.S. Patent No. 6275744). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6275744

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