The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 14, 2001

Filed:

Aug. 03, 1995
Applicant:
Inventors:

Peter David Greene, Harlow, GB;

Mark Silver, Guildford, GB;

Alfred Rodney Adams, Guildford, GB;

Assignee:

Nortel Networks Limited, Montreal, CA;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/03 ; H01L 3/10328 ;
U.S. Cl.
CPC ...
G02F 1/03 ; H01L 3/10328 ;
Abstract

The or each strained quantum well layer of a quantum confined Stark effect modulator is provided with a substructure of substructure layers not all having the same lattice constant. The thickness and composition of these substructure layers may be arranged to produce a differential strain that is asymmetric with respect to the mid-plane of the quantum well and so skews the hole wavefunctions for heavy-holes, HH,, and light-holes, LH,, in opposite directions. This enables the choice of composition designed to provide substantial matching of the E,-HH,and E,-LH,Stark shifts for one particular polarity of applied field, thereby providing a modulation facility that is substantially polarisation insensitive. Alternatively, the thickness and composition of the layers may be chosen to produce a symmetrical strain profile in which the same effect is provided, but for both polarities of applied field.


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