The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 14, 2001
Filed:
Apr. 28, 2000
Applicant:
Inventors:
Shi-Woo Rhee, Pohang-si, KR;
Jae-Young Shim, Kyungsangbuk-do, KR;
Jung-Hyun Lee, Seongnam-si, KR;
Dae-Hwan Kim, Pohang-si, KR;
Assignee:
Postech Foundation, , KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 1/606 ; C07F 7/00 ;
U.S. Cl.
CPC ...
C23C 1/606 ; C07F 7/00 ;
Abstract
An organometallic complex of formula(I) having a low evaporation temperature can be used as a precursor for the MOCVD of a metal compound thin film on semiconductor devices
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Rhee, Shi-Woo. (2001). Organometallic complex process for the preparation thereof and metal organic chemical vapor deposition using same (U.S. Patent No. 6274195). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6274195
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile