The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 14, 2001
Filed:
Jan. 15, 1999
Applicant:
Inventors:
Jiangning Li, Fremont, CA (US);
Ming M. Yang, San Jose, CA (US);
Assignee:
HMT Technology Corporation, Fremont, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C09K 1/300 ; H01L 2/1302 ;
U.S. Cl.
CPC ...
C09K 1/300 ; H01L 2/1302 ;
Abstract
Polishing slurries for use in polishing substrates having a nickel or nickel-containing surface, such as those used for magnetic media, are described. The slurries include, in addition to a chemical etchant such as aluminum nitrate and suspended abrasive particles, an oxidizer which converts nickel metal at the surface to nickel oxide, but does not solubilize the nickel oxide in the aqueous medium to any significant degree. Preferred oxidizers include hydrogen peroxide, ferric nitrate and potassium iodate.