The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 14, 2001

Filed:

Mar. 23, 2000
Applicant:
Inventors:

Mikio Yamamuka, Tokyo, JP;

Tsuyoshi Horikawa, Tokyo, JP;

Takaaki Kawahara, Tokyo, JP;

Fusaoki Uchikawa, Tokyo, JP;

Shigeru Matsuno, Tokyo, JP;

Takehiko Sato, Tokyo, JP;

Akira Yamada, Tokyo, JP;

Masayoshi Tarutani, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 1/600 ;
U.S. Cl.
CPC ...
C23C 1/600 ;
Abstract

A vaporizing device for chemical vapor deposition (CVD) source materials includes a vaporizer for vaporizing introduced CVD source materials by heating, a spray nozzle of which an end portion is fixedly attached to the vaporizer for spraying the CVD source materials into the vaporizer, a cooling mechanism for cooling the spray nozzle, and a heat conduction restrictor attached to the end portion, proximate of the end portion, or to the vaporizer. Generation of non-vaporized residues and particles is decreased, improving productivity owing to prolongation of continuous operation time of the apparatus and a decrease in film defects.


Find Patent Forward Citations

Yamamuka, Mikio. (2001). Vaporizing device for cvd source materials and cvd apparatus employing the same (U.S. Patent No. 6273957). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6273957

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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