The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 07, 2001
Filed:
Oct. 15, 1998
Kiyonobu Kurata, Hachioji, JP;
Kazuhiko Osa, Hachioji, JP;
Olympus Optical Co., Ltd., Tokyo, JP;
Abstract
The invention provides an objective system for use on a single objective type binocular stereomicroscope which, albeit having a parfocal length thereof shorter than a focal length thereof, can reduce various aberrations as much as possible, and a single objective type binocular stereomicroscope system which can be well manipulated while the viewing position is invariable even when objective lenses are interchanged. The objective system for use on a single objective type binocular stereomicroscope comprises an objective lens for converting light from an object into an afocal light flux and two viewing optical units for receiving light emanating from the objective lens to form left and right images, which satisfies condition: 1.0<FL/L<1.6 where FL is a focal length of the objective system, and L is a distance from a first lens surface of the objective system on an image point side to a sample surface.