The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 07, 2001
Filed:
Oct. 29, 1999
Lih Yuan Lin, Middletown, NJ (US);
Evan Lee Goldstein, Princeton, NJ (US);
Robert William Tkach, Little Silver, NJ (US);
AT&T Corp., New York, NY (US);
Abstract
A method and apparatus for curvature-resistant micro-mirror structures to reduce light beam coupling loss due to mirror curvature in free-space micro-machined optical switches is presented. As a significant contributor to light beam coupling loss is the curvature of the micro-mirrors in these cross-connect systems, an improved thick mirror slab utilizing a phosopho-silicate glass (PSG) core is constructed. The PSG core is sandwiched between two poly-silicon layers, thus providing an enhanced, bending-resistant structure which protects the PSG core from the release etchant used in surface micro-machining and substantially reduces mirror curvature. The reflective layer is laid down on top of the enhanced, bending-resistant structure.