The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 07, 2001
Filed:
Jul. 30, 1999
Toshiya Yamaguchi, Tokyo, JP;
NEC Corporation, Tokyo, JP;
Abstract
A wafer with a surface on which a to-be-exposed resist is applied is first placed in a predetermined position. The position of the wafer and an irradiation position of en electron beam to be irradiated for exposing the resist are both aligned. Next, a chip area is exposed by irradiating the electron beam onto the chip area of the wafer in which to-be-manufactured chips are formed. Now, a peripheral area, which is positioned at the periphery of the chip area and in which incomplete chips not to be manufactured are formed, is exposed with the electron beam while setting accuracy of the irradiation position of the electron beam and an exposure amount thereof lower and smaller than accuracy of the irradiation position and an exposure amount thereof when exposing the chip area. After the exposure, the wafer onto which the electron beam has been irradiated is removed from the predetermined position.