The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 07, 2001
Filed:
Aug. 30, 1999
Byung-Gil Ryu, Seoul, KR;
Myeong-Soo Chang, Euiwang, KR;
LG Electronics Inc., Seoul, KR;
Abstract
A composition for barrier ribs of plasma display panels and to a method of fabricating such barrier ribs using the composition is disclosed. The composition for the barrier ribs is SiO,—ZnO—PbO—B,O,based glass. The SiO,—ZnO—PbO—B,O,based glass consists of 10˜20 wt % of SiO,, 10˜30 wt % of ZnO, 5˜30 wt % of PbO, 10˜30 wt % of B,O,, 2˜10 wt % of K,O, 0˜5 wt % of Li,O, 1˜5 wt % of CaO, 3˜8 wt % of Na,O, 1˜5 wt % of Al,O,, and 0˜2 wt % of Sb,O,. In the method of forming the barrier ribs, the SiO,—ZnO—PbO—B,O,based glass powder free from an oxide filler is primarily prepared. Paste or slurry is formed by mixing the SiO,—ZnO—PbO—B,O,based glass with an organic vehicle. A thick film, having a predetermined thickness, is formed on the top surface of a lower substrate using the paste or slurry. Desired barrier ribs are, thereafter, formed by processing the paste or slurry film. In the barrier rib formation step, a pattern is formed on the top surface of the paste or slurry film before the paste or slurry film is etched or abraded using the pattern as a mask. The barrier ribs may be formed by stamping the paste or slurry film using a mold having a shape opposed to the desired pattern of the barrier ribs. The barrier ribs may be also formed by patterning a photoresist paste or slurry film.