The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 07, 2001
Filed:
Oct. 28, 1999
Kazuhiro Onaka, Neyagawa, JP;
Sumio Maekawa, Hirakata, JP;
Shigeru Yamamoto, Katano, JP;
Masafumi Okamoto, Osaka, JP;
Matsushita Electric Industrial Co., Ltd., Osaka, JP;
Abstract
The present invention relates to an artificial latticed multi-layer film deposition apparatus for depositing on a substrate a gigantic magneto-resistive effect film (GMR film) having an artificial lattice structure formed of magnetic metal films and non-magnetic metal films alternately laminated one over the other and its object is to provide the artificial latticed multi-layer film deposition apparatus to enable easy and secure deposition of an artificial latticed multi-layer film having GMR characteristics. In order to achieve the above object, an artificial latticed multi-layer film deposition apparatus of the present invention comprises a target (,) having a magnetron magnet (,) on the bottom surface thereof, a cylindrical chimney (,) covering at least the above target (,) and leaving the end thereof situated opposite to the target (,) open and a chimney top (,) that closes by sealing the end of the chimney (,) left open and also has a chimney top opening (,) on the surface thereof opposing to the target (,), in which, at the time when a substrate (,) passes above the chimney top (,), molecules are generated from the upper surface of the target (,) in the form of a plasma ring (,) and sputtered on the substrate (,) for film deposition.