The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 07, 2001
Filed:
Dec. 22, 1998
Applicant:
Inventors:
Hiroki Goda, Kagawa-ken, JP;
Tomoko Tsuji, Kagawa-ken, JP;
Assignee:
Uni-Charm Corporation, , JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
D21F 1/100 ;
U.S. Cl.
CPC ...
D21F 1/100 ;
Abstract
A method for making an apertured nonwoven fabric includes the steps of: obtaining wet sheet from slurry containing 0.5˜20% by weight of fibrous component in water, which comprises, in turn, thermoplastic synthetic fibers having a length of 7˜30 mm and a fineness of 0.1˜0.8 d, and subjecting the wet sheet to a processing for fiber entangling by high velocity water jet streams and to a processing for aperture forming by aperture forming elements having predetermined configurations adapted to be followed by individual fibers.