The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 31, 2001

Filed:

Oct. 19, 1999
Applicant:
Inventors:

Munechika Tani, Fukaya, JP;

Takashi Murai, Fukaya, JP;

Masatsugu Inoue, Kumagaya, JP;

Assignee:

Kabushiki Kaisha Toshiba, Kawasaki, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 2/907 ;
U.S. Cl.
CPC ...
H01J 2/907 ;
Abstract

A substantially rectangular shadow mask is arranged opposite to a phosphor screen formed on an inner surface of a panel. The shadow mask has a mask body and a mask frame to which a peripheral portion of the mask body is attached. The shadow mask has a rectangular form having a center through which a tube axis passes, and a long axis and a short axis passing through the center and perpendicular to each other. The mask frame has a pair of long side walls extending parallel to the long axis and a pair of short side walls extending parallel to the short axis. The height of each long side wall at a central portion along the tube axis is lower than the height of each short side wall at a central portion along the tube axis.


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