The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 31, 2001
Filed:
Jan. 06, 2000
Paul R. Besser, Austin, TX (US);
Christian Zistl, Dresden, DE;
Nicholas J. Kepler, Saratoga, CA (US);
Advanced Micro Devices, Inc., Austin, TX (US);
Abstract
The present invention is directed to a method of making a semiconductor device. In one illustrative embodiment, the method comprises forming a first layer comprised of polysilicon, forming a second layer comprised of a refractory metal above the layer of polysilicon and converting at least a portion of the second layer to a first metal silicide. The method further comprises forming an anti-reflective coating layer above the layer of refractory metal or the first metal silicide layer, and patterning the first metal silicide layer and the layer of polysilicon to define a gate stack comprised of a first metal silicide region and a layer of polysilicon, forming a plurality of source/drain regions in the substrate, forming a third layer comprised of a refractory metal above at least the gate stack and the source/drain regions, and converting at least a portion of the third layer to a second metal silicide region.