The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 31, 2001
Filed:
Mar. 24, 1999
Rainer Kurz, Taunusstein, DE;
Annegrete Bursch, Ruedesheim, DE;
Franz Hora, Kriftel, DE;
Bodo Kuhmann, Runkel, DE;
Ulrich Schaller, Floersheim-Wicker, DE;
Mitsubishi Polyester Film GmbH, Wiesbaden, DE;
Abstract
The present invention relates to a single or multilayer biaxially oriented film having a thickness of ≦12 &mgr;m, in which T,(TD) is ≧160° C., S 200 (TD) is ≦5%, S 200 (MD) is 2-5%, the shrinkage force ratio N,220/N,160 is ≧4.5; the film fixing peak is ≧210° C.; the film density is 1.39-1.41 g/cm,, and T,(TD) is the temperature at which the transverse shrinkage begins, S 200 (TD) is the shrinkage in the transverse direction (in %) at 200° C., S 200 (MD) is the shrinkage in the machine direction (in %) at 200° C., N,220 is the shrinkage force (in N) at 220° C. and N,160 is the shrinkage force (in N) at 160° C. in the transverse direction. The invention also relates to a method for forming the film.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile