The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 31, 2001
Filed:
May. 19, 1999
Glenn P. Florczak, East Brunswick, NJ (US);
ATOFINA Chemicals, Inc., Philadelphia, PA (US);
Abstract
The present invention concerns the deposition of fluorine modified, titanium dioxide films (TiO,) onto hot glass by atmospheric pressure chemical vapor deposition (APCVD) using TiCl,vapor. The invention is also suitable for depositing other metallic oxide films from their metallic halides such as SnCl,, GeCl,, and VCl,. The present invention provides a process that deposits a novel, fluorine modified, titanium dioxide film (TiO,) onto hot glass by atmospheric pressure chemical vapor deposition using TiCl,vapor. The process uses injection of TiCl,into a hot, nonoxygen containing carrier gas and blends the carrier gas and TiCl,vapor with an oxygen containing gas stream containing a haze reducing quantity of a fluorine containing compound before contacting a surface of hot glass with the blended mixture. The process is capable of depositing a fluorine modified, TiO,film at deposition rates exceeding 900 Å per second. The crystalline phase of the fluorine modified film is essentially anatase. The film has a haze of less then 1% and a refractive index of greater than or equal to about 2.48. Also provided is an apparatus for practicing the process and a novel coated glass.