The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 24, 2001
Filed:
Sep. 14, 1999
Applicant:
Inventors:
Norio Murayama, Musashino, JP;
Hideki Komatsuda, Kawasaki, JP;
Assignee:
Nikon Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21K 5/00 ;
U.S. Cl.
CPC ...
G21K 5/00 ;
Abstract
An exposure apparatus comprises an X-ray source (,), an illumination system (,) for guiding said X-ray from an X-ray source to a mask (,), a projection system (,) for projecting a pattern on said mask by guiding said X-ray to an exposed plane (,) through a mask, wherein a projection system comprises a plurality of mirrors (,), and at least one reflection mirror (,) is interchangeable with a reflection mirror (,) having a different surface shape.
Quick Actions:
Murayama, Norio. (2001). Method for manufacturing a device, an exposure apparatus, and a method for manufacturing an exposure apparatus (U.S. Patent No. 6266389). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6266389
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile