The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 24, 2001

Filed:

Jan. 04, 2000
Applicant:
Inventor:

Daniel Gelbart, Burnaby, CA;

Assignee:

Creo Products Inc., Burnaby, CA;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 2/760 ; B29C 3/504 ; G03C 1/76 ;
U.S. Cl.
CPC ...
G03B 2/760 ; B29C 3/504 ; G03C 1/76 ;
Abstract

An exposure system for liquid photopolymer printing plates has a small movable illumination source. The illumination source moves to expose all of a photopolymer object, such as a printing plate being exposed. The area covered by the light source can be adjusted to match the area of the printing plate. The system does not require a large uniform source of illumination. The collimation of the light source is variable. This permits control over the cross sectional profile of exposed features in the photopolymer. Preferably a flat horizontal glass plate supported by air pressure supports the photopolymer being exposed. An optical sensor and a control system are used in preferred embodiments to keep the plate flat by controlling air pressure in an enclosure beneath the plate.


Find Patent Forward Citations

Loading…