The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 24, 2001
Filed:
Jan. 22, 1999
Applicant:
Inventors:
Gerhard Schneider, Cupertino, CA (US);
Edwin C. Weldon, Los Gatos, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 1/644 ;
U.S. Cl.
CPC ...
C23C 1/644 ;
Abstract
A process chamber,for processing a substrate,, such as a semiconductor wafer, comprises a support,having a surface,for supporting the substrate,. A gas distributor,in the chamber comprises a gas manifold,comprising at least one insert,having an orifice,for passing gas from the gas manifold,into the process chamber,. Preferably, the gas manifold,extends about a perimeter,of the substrate,and comprises a plurality of inserts,made from dielectric material.