The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 17, 2001
Filed:
Sep. 24, 1999
Sander G. den Hartog, Eindhoven, NL;
Pieter K. de Bokx, Eindhoven, NL;
U.S. Philips Corporation, New York, NY (US);
Abstract
In order to achieve suitable positional resolution for an angular scan in Grazing Exit X-ray Fluorescence (GEXRF), the sample (,) should be irradiated with a small spot (,). Consequently, the fluorescent radiation yield is low so that the duration of a measurement is comparatively long. In order to mitigate this drawback, the invention proposes the use of an analyzing X-ray mirror (,) having a line focus (,) extending perpendicularly to the sample surface (,). The line focus (,) coincides with a line-shaped PSD (,), so that every position on the PSD corresponds to a given height on the mirror, which height itself corresponds to a given take-off angle of the fluorescent radiation relative to the sample surface. Excellent positional resolution and an attractive fluorescent radiation yield are obtained by irradiating the sample by way of a focused electron beam.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile