The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 17, 2001
Filed:
Feb. 04, 1999
Applicant:
Inventors:
Dominic W. K. Yeung, Mississauga, CA;
Richard E. Rice, Mississauga, CA;
Assignee:
Rhodia Inc., Cranbury, NJ (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F / ;
U.S. Cl.
CPC ...
C08F / ;
Abstract
A process of manufacturing a poly(dimethylaminoethyl(meth)acrylate) comprising polymerizing dimethylaminoethyl(meth)acrylate in water and in the presence of sufficient acid to form a solution having a pH of less than 6. The polymer is made in an aqueous medium and with a free radical initiator. The polymer is useful as a foam booster in a variety of formulations and applications.
Yeung, Dominic W. K.. (2001). Process for manufacturing homopolymers and copolymers of dimethylaminoethyl(meth)acrylate (U.S. Patent No. 6262212). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6262212
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile