The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 17, 2001
Filed:
Feb. 25, 1999
Steven Verhaverbeke, Radnor, PA (US);
Gerald N. DiBello, West Chester, PA (US);
Christopher F. McConnell, Berwyn, PA (US);
CFMT, Inc., Wilmington, DE (US);
Abstract
The present invention provides systems and methods of determining the concentration of chemicals in a wet processing stream where the wet processing stream is formed from two or more liquid streams having known chemical concentrations. The concentration of chemicals in the wet processing stream are monitored by measuring the flow rates of the liquid streams during combination to form the wet processing stream, and calculating the concentrations of chemicals in the wet processing stream based on the flow rates and known chemical concentrations of the liquid streams. The present invention also provides systems and methods for controlling the wet processing of semiconductor substrates using the calculated concentrations in the wet processing stream. The methods and systems of the present invention are particularly useful when the semiconductor substrates are contacted with the wet processing stream in a single pass.