The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 17, 2001
Filed:
Feb. 16, 2000
Applicant:
Inventors:
Gerhard Schneider, Cupertino, CA (US);
Andrew Nguyen, San Jose, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 1/600 ; H01L 2/100 ;
U.S. Cl.
CPC ...
C23C 1/600 ; H01L 2/100 ;
Abstract
A pressure controlled substrate processing chamber comprising a pressure control ring and a throttling ridge. The pressure control ring is movably disposed proximate the throttling ridge to define a variable flow orifice. The pressure control ring is translated by a ring actuator in response to pressure information retrieved from the processing chamber. The translation of the pressure control ring causes the size of the orifice to change, thus inducing a pressure change within the chamber.