The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 17, 2001

Filed:

Oct. 24, 1997
Applicant:
Inventors:

Tsutomu Hashizume, Nagano, JP;

Tetsushi Takahashi, Nagano, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B41J 2/045 ;
U.S. Cl.
CPC ...
B41J 2/045 ;
Abstract

An ink jet print head includes PZT films formed on a first surface of a single-crystal silicon substrate, ink cavities formed in the regions of the single-crystal silicon substrate which correspond in position to the PZT films, and a nozzle plate formed on a second surface of the single-crystal silicon substrate, which is opposite to the first surface. Each ink cavity is formed using anisotropical wet and dry etching, and wherein a portion of each ink cavity close to the first surface of the single-crystal silicon substrate is anisotropically dry etched.


Find Patent Forward Citations

Hashizume, Tsutomu. (2001). Ink jet print head formed through anisotropic wet and dry etching (U.S. Patent No. 6260960). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6260960

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…