The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 10, 2001
Filed:
Aug. 26, 1999
Quoc H. Pham, Playa Del Rey, CA (US);
Albert Ezekiel, Los Angeles, CA (US);
Raytheon Company, Lexington, MA (US);
Abstract
A Radon transform based method that provides for target azimuth aspect estimation and target shape measurement. A Radon transform is applied to a binary (N×N pixels) target chip to extract target features that are then used to measure length, width, and diagonal features of the target. In parallel, these features are used to estimate the azimuth aspect angle, or size, of the target. The method is effective in discriminating targets from clutter. The method is also very time efficient and highly flexible in its operation because the features can automatically account for any target rotation or shift. The present invention also provides for a target acquisition system that employs the Radon transform based method for target azimuth aspect estimation.