The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 10, 2001

Filed:

Sep. 29, 2000
Applicant:
Inventors:

Hwei-Ling Yau, Rochester, NY (US);

Thomas H. Whitesides, Rochester, NY (US);

Elmer C. Flood, Canandaigua, NY (US);

Amy E. Jasek, Rochester, NY (US);

Assignee:

Eastman Kodak Company, Rochester, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C 1/108 ; G03C 1/106 ; G03C 1/76 ; G03C 5/305 ; G03C 5/38 ;
U.S. Cl.
CPC ...
G03C 1/108 ; G03C 1/106 ; G03C 1/76 ; G03C 5/305 ; G03C 5/38 ;
Abstract

The present invention relates to imaging elements, including photographic elements and recording media, having a protective overcoat that resists fingerprints, common stains, and spills. More particularly, the present invention provides a processing-solution-permeable protective overcoat that is water resistant in the final processed product. The overcoat, before formation of the image, comprises hydrophobic polymeric particles in a gelatin matrix. Subsequent treatment of the overcoat, after formation of the image, to remove the gelatin, causes coalescence of the hydrophobic particles, resulting in the formation of a water-resistant continuous protective overcoat.


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