The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 10, 2001
Filed:
Apr. 15, 1999
Applicant:
Inventors:
Assignee:
Alps Electric Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/26 ;
U.S. Cl.
CPC ...
G03F 7/26 ;
Abstract
Since each interval between slider bars,is filled with a resist film,, the surface of each slider bar,is made flat. Consequently, the surface of the resist film,bonded to the surface of each slider bar can be easily made flat, whereby the etching patterns of ABS planes can be formed on the surface of the resist film,with a good dimensional accuracy.
Sato, Toshihiko. (2001). Pattern forming method (U.S. Patent No. 6258515). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6258515
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile