The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 10, 2001
Filed:
Aug. 26, 1999
Applicant:
Inventor:
Takeshi Miyachi, Utsunomiya, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 9/00 ;
U.S. Cl.
CPC ...
G03F 9/00 ;
Abstract
A method of producing a mask for use in lithography is disclosed, wherein a structure having a membrane and a mask substrate for supporting the membrane are prepared, while a pattern is to be formed on the membrane, wherein a force is applied to the structure so that distortion is produced in the membrane, and wherein a pattern is formed on the membrane with the force being applied to the membrane, whereby accurate magnification correction can be accomplished.
Miyachi, Takeshi. (2001). X-ray mask structure and method of making the same (U.S. Patent No. 6258492). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6258492
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile