The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 10, 2001
Filed:
Jan. 13, 1995
Applicant:
Inventor:
Mark A. Mueller, San Jose, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 1/434 ;
U.S. Cl.
CPC ...
C23C 1/434 ;
Abstract
A method of deposition for W or TiW on a silicon wafer in a physical vapor deposition chamber equipped with a clamping ring without incurring arcing problem between the wafer and the clamping ring by utilizing a novel two-step high-pressure/low-pressure process in which a first depositing step is carried out at a relatively high pressure above 11 mTorr so as to form an electrical bridge between the wafer and the clamping ring and a second depositing step is carried out at a lower pressure so as to form a high-quality conductive film.