The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 03, 2001

Filed:

Sep. 30, 1998
Applicant:
Inventors:

Shiro Sakushima, Nara, JP;

Koji Takemura, Kyoto, JP;

Michiaki Hiraoka, Uji, JP;

Mikio Kyomasu, Suwa, JP;

Assignee:

Kyocera Corporation, Kyoto, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 6/30 ;
U.S. Cl.
CPC ...
G02B 6/30 ;
Abstract

On one principal plane of a silicon substrate,, a silicon oxide film,having an opening,is formed, and a silicon nitride film,having an opening,overlapping the opening,and a recessed marker,is stacked on the silicon oxide film,. Next, the substrate,is etched through the openings,to provide an alignment groove,for an optical waveguide, and an electrode pattern,is formed. Light of which wavelength transmits through the substrate,and the silicon oxide film,is radiated from the other principal plane of the substrate,, and the optical element is assembled with the marker,serving as the reference while the marker,and the optical element are monitored.


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