The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 03, 2001

Filed:

Jun. 25, 1998
Applicant:
Inventors:

Erez Ravid, Jerusalem, IL;

Ido Holcman, Rechovot, IL;

Vladimir Mikolinsky, Rechovot, IL;

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 2/100 ;
U.S. Cl.
CPC ...
G01N 2/100 ;
Abstract

A system for on-the-fly automatic defect classification (ADC) in a scanned wafer. The system includes a light source illuminating the scanned wafer so as to generate an illuminating spot incident on the wafer. Sensor collecting light scattered from the spot by the at least two spaced apart detectors, and processor analyzing the collected light so as to detect defects in the wafer and classifying the defects into distinct defect types.


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