The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 03, 2001
Filed:
Jul. 23, 1999
Yoshiaki Yamada, Tokyo, JP;
Eiichi Ishikawa, Tokyo, JP;
Mitsubishi Denki Kabushiki Kaisha, Tokyo, JP;
Abstract
A method of forming a resist pattern and a method of manufacturing a semiconductor device using the method of forming the resist pattern, characterized in that a surface of an organic base coating,formed on an etched film,is reformed depending on properties of a material of a resist film,whereby, in dual processes for forming a lower layer of the organic coating provided to process the etched film, an amount of usable resist is increased and an accuracy of dimensions of the etched film after processing can be improved.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile