The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 03, 2001

Filed:

Jul. 12, 1999
Applicant:
Inventors:

Akihisa Yoshida, Kyoto, JP;

Masatoshi Kitagawa, Hirakata, JP;

Masao Uchida, Ibaraki, JP;

Makoto Kitabatake, Nara, JP;

Tsuneo Mitsuyu, Hirakata, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/142 ;
U.S. Cl.
CPC ...
H01L 2/142 ;
Abstract

An impurity doped SiC substrate,and SiC thin film,are irradiated with a laser light,having a wavelength longer than such a wavelength that a band edge absorption of a semiconductor is caused. The wavelength of the laser light,may be such a wavelength that an absorption is caused by a vibration by the bond of an impurity element and an element constituting the semiconductor, for example, a wavelength of 9 &mgr;m to 11 &mgr;m. Specifically, in the case where Al is doped in SiC, the wavelength of the laser light,may be within the range of 9.5 &mgr;m to 10 &mgr;m.


Find Patent Forward Citations

Yoshida, Akihisa. (2001). Method and device for activating semiconductor impurities (U.S. Patent No. 6255201). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6255201

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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