The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 03, 2001

Filed:

Sep. 29, 1998
Applicant:
Inventor:

Dieter Dornisch, Carlsbad, CA (US);

Assignee:

Conexant Systems, Inc., Newport Beach, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/176 ;
U.S. Cl.
CPC ...
H01L 2/176 ;
Abstract

An improved microelectronic device and methods for forming the device are disclosed. The device includes a conductive feature formed on a semiconductor wafer by creating a trench within an insulating material, depositing barrier material substantially only within the trench, depositing conductive material on the wafer surface and within the trench, and removing the conductive material from the wafer surface. Alternately, the barrier material may be deposited onto the wafer surface and the trench and removed from the wafer surface prior to conductive material deposition.


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Dornisch, Dieter. (2001). Methods for barrier layer formation (U.S. Patent No. 6255192). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6255192

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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